Exhaust and Drain: All Laurell EDC™ systems come standard with an adjustable down-flow exhaust and drain.
Note: the system's exhaust is also monitored by the process controller and must always remain sufficiently within range to run.
Chucks and Adapters: Laurell always recommends the exclusive use of non-vacuum chucks with EDC™ systems. We also offer thousands of chucks and adapters. Details
Liners: Removable, reusable process chamber liners, made from FEP Teflon®, are available for every Spin Coater model.
In-Deck Mounting (IND): Allows the fully-sealed spin processor to be permanently installed into a wet-bench with remotely mounted controller. Details
On-Deck Mounting (OND): Features an earthquake-proof base mounting with remotely mounted controller. Commonly used with glovebox or wet-bench mounting. Details
Teflon® Housing: Substitute NPP with Teflon® for use with processes that require chemistry to be dispensed at elevated temperatures. Details
High-Performance Drive: up to 12,000 RPM (depending upon the controller, chuck material, substrate size and mass). For specifics, see: Details
Integrated Variable Pneumatic Vacuum Generator (IV-PVG): no moving parts, easy to clean. For specifics, see: Details
Back Side Rinse (BSR): An adjustable injector can dispense material on the bottom side of the substrate simultaneously with top side. This technique is most commonly used with DI water to limit back side damage during etching.
Dynamic Linear Dispense (DLD): See Details
Dynamic Radial Dispenser (DRD): See Details
Rinse to Resistivity: Detects rinse completion and alerts the processor to dry the substrate, saving valuable resources usually wasted on a time-based system.
Level Detection: Either in a drain reservoir or supply container.
Leak Detection: Laurell uses the most dependable sensor technology availableaudio and video alarm with industry-standard light tree.
Heated Process Chemistry: with point-of-use or recirculation type heat exchanges.
Dual Containment Plumbing: For an extra layer of safety, when heated or dangerous materials are dispensed, Laurell always recommends the use of double-walled plumbing.
Wafer Alignment Tools: Laurell's proprietary wafer alignment tools can be used to effortlessly center wafers on vacuum chucks. Details
B EDC System Specifications
Process Controller: The 650-series process controller utilizes a robust microprocessor and with the use of its accompanying PC software (written in an object-oriented programming language) it achieves nearly unheard of flexibility both in process definition and use. This controller allows operator interaction in real-time during the process execution including pausing time, stopping and continuing on from that point. The system can and will be continually updated easily and quickly in the field with downloadable firmware revisions. (we plan ahead at Laurell!) Researchers worldwide have developed unique processes which will ONLY run with the level of control sophistication we offer.
The 650-series controller can also be used in conjunction with a PC with Spin 3000, Laurell's exclusive process management software, however this is NOT required to program or run the equipment. The use of a PC adds the ability to record a process as it's run, operate remotely, program or communicate across a LAN or the Internet. The software, which is supplied at no additional cost, allows the operator to create virtual process simulations even beyond the capabilities of the hardware-installed spin processor, in effect letting them try it before they commit to a process. All 650 systems can be upgraded or re-purposed without return to the factory with simple plug-in modules, either actually or virtually, and can contain a near-unlimited number of processes and steps.
A Brief Description: The housing for this system is typically made from a solid co-polymer blend exclusive to Laurell Technologies. Unlike pure Natural Polypropylene, this material is able to resist solvents and strong acids and bases. Samples are available for testing and verification upon request. A solid PTFE Hostaflon® TFM-1600 / Teflon® AF housing is available (popular for high-temperature chemistry and sub-micron particle studies). Laurell's unique internal bowl-shaped chamber with its bottom gutter and clear dome lid controls the flow of liquids and gases efficiently from dispense point to drain.
No "splash rings" needed, or accidental drips onto the substrate. Our oversized Adjustable Down-Flow Exhaust and Drain allows and continuously monitors the process chamber's atmospheric balance, providing the user maximum control and repeatability. The 650 controller intelligently monitors not only the exhaust pressure within the process (standard), but optionally many other parameters, like temperature in a heated supply loop, drain water resistivity of a rinse, pH changes, etc. The upper plenum closes inside the base to provide an overlapping seal. The EDC™'s process chamber is electrically interlocked so rotation and dispensing are disabled when open and latched, and locked until finished with 0 RPM is sensed. A bowl-wash and dry routine can be added to each process or run independently. (another important Laurell EDC standard)
A proprietary labyrinth seal protects the motor and control electronics from chemical contamination. This seal provides the process chamber with Nitrogen purge and has been proven to be particle-free on a sub-micron level during field testing. The systems clear top is made from ECTFE (unless otherwise stated) and only ECTFE-coated 316 stainless steel screws are used in some non-wetted areas throughout the system.
Need more details? See EDC 650 Series.
Operator and System Safety
Complete electrical isolation from the operator, fool-proof door interlock, and ETL certification, UL, and CSA approval of components assure many years of safe, trouble-free performance. Interlocks prevent rotation when the vacuum switch has not been engaged and when the lid is open. All Laurell systems are CE and RoHS compliant, and all certificates are sent with each system. For more information, please visit the Safety page.
The "process safeguard" feature of all Laurell process controllers ensures that the same process cannot inadvertently be run on the same substrate. This feature can easily be bypassed to run the same process again without opening the system or a sequence can be run over and over (looping).
N2 Process/Seal Purge: 60–70 PSIG (4–5 bar) of Nitrogen/CDA is required to pressurize the labyrinth-type motor seal. This gas also purges the process chamber. The gas consumption is very low, at 3 cubic feet per hour (0.085 m3/hour). 10 feet (300 cm) of 3/16 inch (~4 mm) inside diameter X 1/4 inch (~6 mm) outside diameter PE tubing is provided.
Vacuum: 25–28 inches (~635–711mm) Hg of vacuum with a flow volume of 4.5 SCFM (0.127 cubic meters/minute) at 0 inches Hg is suggested. 10 feet (300 cm) of 3/8 inch (~9.5 mm) outside diameter X 1/4 inch (~6 mm) inside diameter PE tubing is provided.
Power: 95 to 240VAC, 47/63HZ, ~300 Watts
The WS-650 series is typically employed for Solvent, Base or Acid-based processing: Coating, Etching, Developing, Rinsing-Drying and Cleaning. While all of these process are supported, Laurell recommends single-use only, due to known material conflicts. For example, Photoresist and Developer (cross-contamination), and SC-1 & SC-2 (HCl + NH4OH), creating NH4Cl, a hazardous inhalation risk. Many dispense options, both manual and automatic, are available.
Continued Process Development:
A spray coating technique is currently in the prototype stage, focusing on our MEMS Customers. We believe there is a more straightforward and affordable approach for uniformly coating high-aspect-ratio features found in MEMS work. We are currently looking for a few partners to help with beta-testing the system. If you have such an interest, please contact us with your specific needs.