Laurell TV
Wafer Alignment Tool
Wafer alignment workflow for improved placement repeatability.
Spin Coaters
Overview of Laurell's Lz platform and core spin-coating capabilities.
Highlights EDC workflows and customer applications across global labs.
A concise look at etch, develop, and clean process solutions.
Demonstrates coordinated operation of multiple Laurell spin processors.
Walkthrough of the touch interface for rapid recipe and process control.
Sample process sequence for etch, develop, and clean operations.
Chucks
Low-contact and BSR chuck options for sensitive substrates.
Chuck variety built for diverse wafer and substrate geometries.
Processing chuck options for fragmented or irregular sample handling.
Embedded chuck configuration and use-case overview.
Performance benefits and setup notes for high-porosity chucks.
Microscope slide processing with dedicated chuck support.
Dispensers
Single-shot dispensing behavior and process timing essentials.
Adjustable-mount universal dispenser setup and operation.
UD-3 dispenser capabilities for repeatable process delivery.
Dynamic linear dispense mode for improved material distribution.
